MultiBeam SEM/FIB, este microscopio cuenta con un sistema multi haz versátil y de fácil uso, combina la alta resolución de iones con la columna SEM. El JIB-4500 MultiBeam ofrece un mayor rendimiento y productividad para una gran variedad de aplicaciones en el análisis de materiales nanoestructurados en sistemas de nanofabricaciones, ofrece las siguientes características:
* Large current milling mode (maximum milling current 30 nA).
* High resolution electron (LaB6) and ion optics.
* Charge-free imaging and analysis.
* Bitmap milling system.
* Standard airlock system for fast and easy sample loading.
* Low mag mode identifies milling positions
Especificaciones
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JIB-4500 MultiBeam SEM-FIB
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FIB
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Ion source
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Ga liquid metal ion source
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Resolution
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5nm @ 30kV
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Accelerating voltage
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1 to 30kV (in steps)
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Magnification
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30x (for wide view)
100X to 300,000X
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Maximum beam current
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30nA (at 30kV)
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SEM
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Beam source
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LaB6
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Resolution
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2.5nm @ 30kV
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Accelerating voltage
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0.3 to 30kV (in steps)
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Magnification
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5X to 300,000X
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Maximum beam current
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1,000nA (at 30kV)
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Goniometer stage
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X: 76mm; Y: 76mm;
Z: 5 to 48mm
Z’ for eucentric point adjustment
T: -10° to 90°; R: 360° endless
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Vacuum pump
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SIP (x2), TMP/RP (x2)
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Standard features
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Low vacuum (LV)
Backscatter detector (BEI)
Gas injection unit (1)
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